Cross-sectional TEM images and energy-dispersive x-ray measurements from high-angle annular dark-field scanning TEM for different thin films. (A) Pure HfOx deposited at 400°C. Clear crystallites are visible in the film; red arrows indicate some of the grain boundaries. (B) Pure HfOx deposited at 30°C. While these films are not polycrystalline like pure HfOx deposited at 400°C, neither are they as uniform as the composite films presented in (C). (C) The thin films which resulted in stable electrical performance are amorphous or nanocrystalline. Some pillar-like structures can be discerned, indicated by red arrows. The addition of Ba to the films clearly leads to material uniformity by suppressing crystallization...Read More
Recent Comments